CeNSE at the Indian Institute of Science (IISc), Bangalore, is organising an in-person workshop on semiconductor manufacturing & characterization to build industry-relevant skills. Over 90 hours you will get exposure to cleanroom fabrication steps (lithography, etching, deposition), advanced metrology, process variability, yield improvement, and real device fabrication (e.g. MOSFET). Targeted at both academic and industry professionals.
Workshop Details
| Feature | Details |
|---|---|
| Title | Advanced Workshop on Semiconductor Manufacturing |
| Organiser | Centre for Nano Science and Engineering (CeNSE), Indian Institute of Science, Bangalore |
| Dates | 20-28 November 2025 |
| Duration | 90 hours |
| Who Can Apply | Faculty, academicians, students, industry professionals/start-ups with relevant interest/expertise |
| Fee | Students / Academic Scholars: ₹50,000 + GST • Non-academic / Industry: ₹1,50,000 + GST |
| Last Date to Apply | 12 November 2025 |
| Venue | IISc Bangalore (Campus Immersion + two days virtual lectures) |
| Contact | [email protected] |
About the Workshop
India is rapidly expanding its semiconductor manufacturing ecosystem, aiming to build expertise via missions like the India Semiconductor Mission. To meet the growing demand (30,000+ skilled personnel by 2027 and ~65,000 by 2032), IISc’s CeNSE is offering this workshop to bridge the skills gap in fabrication and characterization.
What You’ll Learn
The program includes:
-
Hands-on training in core semiconductor fabrication: lithography, thin-film deposition, wet & dry etching, high-temperature processing.
-
Using advanced characterization tools: SEM, AFM, XRD, Raman spectroscopy, and probe stations.
-
Understanding cleanroom operations and contamination control, process variability, and yield enhancement.
-
Insight into real device fabrication flow (e.g: MOSFET device) and “tape-out” – the collaboration between design houses and foundries.
-
Expert talks, literature reviews, and research proposal preparation.
Facilities & Infrastructure
-
National Nanofabrication Centre (NNfC): ~14,000 sq.ft cleanroom facility (Class 100 / 1000) capable of optical lithography (1 µm) and e-beam lithography (down to ~10 nm).
-
Micro & Nano Characterization Facility (MNCF): comprehensive tools to support all major characterization needs in nanofabrication. CeNSE
-
Packaging facility for wafer sawing, wire bonding etc.
Costs & Logistics
-
Fee: ₹50,000 + GST for students/academics; ₹1,50,000 + GST for industry or non-academics.
-
The workshop includes campus immersion plus two days of virtual lectures.
-
Accommodation & meals (breakfast, lunch, dinner) provided during the on-campus portion.
-
No provision of travel allowance (TA) or dearness allowance (DA).
Who Should Attend
Ideal participants include:
-
Students, researchers, and faculty members want hands-on exposure in semiconductor fabrication and advanced device characterization.
-
Engineers or professionals from industry/startups looking to upskill in cleanroom-based processes or quality/yield improvement in semiconductor manufacturing.
-
Anyone interested in understanding the full semiconductor device fabrication flow, from lithography → deposition → etching, → metrology.
How to Register
-
Fill in the registration form (via the IISc CeNSE link).
-
Submit relevant participant details before 12 November 2025.
-
Payment of workshop fee (as per your category) + GST.
-
Attend virtual lectures + campus immersion.
For queries, contact: [email protected].
Why This Workshop Matters
-
Builds your foundational & advanced skills needed in semiconductor manufacturing, relevant globally.
-
Access to state-of-the-art infrastructure (NNfC, MNCF) at one of India’s premier institutes.
-
Networking with academic & industry experts.
-
Certificate of participation.
-
Contributes to national goals in semiconductor capacity building.
Important Notes
-
Participants must complete assessments to earn relevant certifications.
-
Fee does not include travel costs.
-
Last date is firm: 12 November 2025. Late applications may not be considered.
Reference & Contact
Table of Contents