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Atomic Layer Deposition (ALD) grows films one atomic layer at a time, with very precise thickness control and uniform coverage. It is now a core process in making semiconductors, memory, energy devices and advanced coatings. India now has a dedicated international meeting on the technique.
The Indian Institute of Technology Bombay will host the International Workshop on Atomic Layer Deposition: Materials-to-Manufacturing (ALD-M2M 2026) from 13 to 15 December 2026 at the VMCC Auditorium, IIT Bombay, Mumbai. The organisers describe it as India’s first international workshop devoted to ALD. Its aim is to connect fundamental research with industrial-scale manufacturing.
ALD-M2M 2026 at a glance
| 📅 Dates | 13–15 December 2026 |
| 📍 Venue | VMCC Auditorium, IIT Bombay, Mumbai, India |
| 🌐 Website | www.ee.iitb.ac.in/aldm2m |
| ✉️ Contact | [email protected] |
| 🏛️ Host | Indian Institute of Technology Bombay |
Why this Atomic Layer Deposition workshop matters
The workshop covers the whole ALD value chain: new precursor chemistries, atomic-scale process control, characterisation, device integration and high-volume production. It brings together academic researchers, students, process engineers, equipment and precursor suppliers, and industry. The stated goal is to help turn laboratory results into scalable technology, which matters as India builds up its semiconductor manufacturing.
Workshop tracks
- Fundamentals of ALD: materials, processes and characterisation
- ALD applications: technology and manufacturing
- Emerging areas and special topics: Atomic Layer Etching (ALE), Area-Selective Deposition (ASD), computational ALD, precursor synthesis and more
Plenary speakers
- Prof. Ageeth Bol, University of Michigan, USA
- Prof. Anjana Devi, IFW Dresden and TU Dresden, Germany
- Prof. Jin-Seong Park, Hanyang University, Republic of Korea
- Dr. Michael Nolan, Tyndall National Institute, Ireland
Invited and industry speakers
Invited speakers come from universities and research institutes, including Université Grenoble Alpes–CNRS, University at Albany (SUNY), University of Central Florida, Phenikaa University, SRMIST and IIST. Industry speakers include Lam Research, Micron Technology, Veeco Instruments, EMD Electronics and Dockweiler Chemicals.
Industry panel
The industry panel features speakers from Lam Research, Tokyo Electron India, Kepler Computing, C-MET Pune and IISc Bangalore.
Programme format
The three-day programme includes plenary and invited talks, poster pitches and poster sessions, and a welcome reception at VMCC on the opening evening. See the official programme page for the latest schedule.
Organisers and advisory committee
The workshop is organised by IIT Bombay faculty Gopalan Rajaraman, Maheswaran Shanmugam, Saurabh Lodha, Triratna Muneshwar and Venkatakrishnarao Dasari. An international advisory committee includes members from IFW Dresden, the Colorado School of Mines, UCF, UC San Diego and Kepler Computing.
Frequently asked questions
When and where is ALD-M2M 2026?
ALD-M2M 2026 takes place from 13 to 15 December 2026 at the VMCC Auditorium, IIT Bombay, Mumbai, India.
Who should attend?
Academic researchers, students, process engineers, equipment and precursor suppliers, and industry professionals working on thin films, semiconductors and advanced manufacturing.
What topics are covered?
ALD fundamentals, materials and characterisation; ALD applications in technology and manufacturing; and emerging areas such as Atomic Layer Etching, Area-Selective Deposition, computational ALD and precursor synthesis.
How can I contact the organisers?
Email [email protected] or visit the ALD-M2M 2026 website.
Official links
NanoHelp.eu will continue to highlight meetings that link nanoscale science with real-world manufacturing.
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